Pure Si at 500 K has equal number of electron (ne) and hole (nh) concentrations of 1.5 x 1016 m-3. Doping by Indium increases nh to 4.5 x 1022 m-3.
The doped semiconductor is of:
n-type with electron concentration ne = 2.5 x 1023 m-3
p-type having electron concentration ne = 5 x 109 m-3
n-type with electron concentration ne = 2.5 x 1022 m-3
p-type with electron concentration ne = 2.5 x 1010 m-3